Hardware and Software Development of a Diffuse Reflectance Spectroscopy (DRS) System to Measure Temperature of Semiconductor Substrates in-situ

Abstract

A Diffuse Reflectance Spectroscopy (DRS) system is developed for measuring the temperature of semiconductor materials in Ultra High Vacuum (UHV) environment. DRS is an optical method to monitor the temperature of materials with a temperature dependent bandgap. The system is calibrated and tested for semi-insulating (SI) and n-type GaAs substrates. In the current communication, the hardware, software development and system calibration are reported.